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Low temperature growth of photoactive titania by atmospheric pressure plasma

Hodgkinson, JL, Yates, HM and Sheel, DW 2009, 'Low temperature growth of photoactive titania by atmospheric pressure plasma' , Plasma Processes and Polymers, 6 (9) , pp. 575-582.

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    Abstract

    Atmospheric pressure glow discharge plasma CVD was used to deposit thin films of titania at 200 8C using two different precursors. The resulting films were characterised using techniques including XPS, RBS and XRD. It was established that annealing at temperatures as low as 275 8C produced crystalline films that were photocatalytically active. When annealed at 300 8C the photoactivity was greater than that of commercially available ‘‘self-cleaning’’ titania films. The effects of the different precursors, annealing times and temperatures on the crystallinity and photoactivity are discussed.

    Item Type: Article
    Themes: Energy
    Schools: Colleges and Schools > College of Science & Technology > School of Computing, Science and Engineering > Materials & Physics Research Centre
    Journal or Publication Title: Plasma Processes and Polymers
    Publisher: Wiley
    Refereed: Yes
    ISSN: 1612-8850
    Depositing User: HM Yates
    Date Deposited: 21 Oct 2011 10:25
    Last Modified: 31 Jul 2014 13:31
    URI: http://usir.salford.ac.uk/id/eprint/18571

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