Low temperature growth of photoactive titania by atmospheric pressure plasma
Hodgkinson, JL, Yates, HM and Sheel, DW 2009, 'Low temperature growth of photoactive titania by atmospheric pressure plasma' , Plasma Processes and Polymers, 6 (9) , pp. 575-582.
- Published Version
Restricted to Repository staff only
Download (564kB) | Request a copy
Atmospheric pressure glow discharge plasma CVD was used to deposit thin films of titania at 200 8C using two different precursors. The resulting films were characterised using techniques including XPS, RBS and XRD. It was established that annealing at temperatures as low as 275 8C produced crystalline films that were photocatalytically active. When annealed at 300 8C the photoactivity was greater than that of commercially available ‘‘self-cleaning’’ titania films. The effects of the different precursors, annealing times and temperatures on the crystallinity and photoactivity are discussed.
|Schools:||Colleges and Schools > College of Science & Technology > School of Computing, Science and Engineering > Materials & Physics Research Centre|
|Journal or Publication Title:||Plasma Processes and Polymers|
|Depositing User:||HM Yates|
|Date Deposited:||21 Oct 2011 09:25|
|Last Modified:||25 Aug 2015 13:07|
Actions (login required)
|Edit record (repository staff only)|