The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target
Karthikeyan, S, Hill, AE and Pilkington, RD 2014, 'The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target' , Thin Solid Films, 550 , pp. 140-144.
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Transparent conductive oxide layers are widely used in various applications such as solar cells, touch screen displays, heatable glasses, etc. This present work describes the deposition of transparent and conducting In2O3 films from In2O3 powdered targets using a pulsed d.c magnetron sputtering technique without additional substrate heating or substrate biasing. The films deposited at various oxygen concentrations were approximately 500 nm thick, were pin-hole free and well adhered to the glass substrates. The material characteristics of the films were analysed using X-ray diffraction, four point probe, hot probe, UV–vis spectroscopy, atomic force microscopy and profilometry. Structural and electrical analyses revealed that the films were crystalline and highly conductive when sputtered in the absence of oxygen but a dramatic change in resistivity was observed when oxygen was introduced during the deposition. Resistivity increased from 0.004 Ω cm (no oxygen) to 5 Ω cm with 10% oxygen.
|Uncontrolled Keywords:||Indium oxide thin films; Pulsed d.c magnetron sputtering; Low temperature sputtering; Powder target sputtering|
|Schools:||Schools > School of Computing, Science and Engineering|
|Journal or Publication Title:||Thin Solid Films|
|Depositing User:||S Rafiq|
|Date Deposited:||02 May 2014 05:56|
|Last Modified:||30 Nov 2015 23:54|
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