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The development of high performance SnO2:F as TCOs for thin film silicon solar cells

Yates, HM, Evans, P, Sheel, DW, Nicolay, S, Ding, L and Ballif, C 2012, 'The development of high performance SnO2:F as TCOs for thin film silicon solar cells' , Surface & Coatings Technology, 213 , pp. 167-174.

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Abstract

High performance transparent conducting oxides (TCOs) have significance for optimising photovoltaic (PV) performance. The efficiency of the resulting solar cells is dependent particularly on achieving high light scattering, low resistivity and low absorption (via low FCA). These properties have been targeted by systematic exploration of the atmospheric pressure chemical vapour deposition growth parameters, in particularly the deposition temperature and growth rate. APCVD processes are particularly suited to use in industry due to the high volume, continuous growth processes and fast growth rates achievable. Using the APCVD process, F-doped SnO2 has been deposited on glass using monobutyl tin trichloride with trifluoro-acetic acid as the dopant source. The deposited films were characterised for crystallinity, morphology (roughness), optical haze and electrical properties (via Hall measurement) to aid optimisation of material suitable for solar cells. Samples were then used in manufacture of single a-Si:H solar cells, which showed enhanced performance, in comparison to commercially available TCO CVD coated glasses, with high quantum efficiency yield.

Item Type: Article
Themes: Energy
Schools: Schools > School of Computing, Science and Engineering > Salford Innovation Research Centre (SIRC)
Journal or Publication Title: Surface & Coatings Technology
Publisher: Elsevier
Refereed: Yes
ISSN: 02578972
Related URLs:
Funders: EU 7th Framework Programme for Research and Technological Development
Depositing User: HM Yates
Date Deposited: 08 Jun 2015 18:17
Last Modified: 29 Oct 2015 00:10
URI: http://usir.salford.ac.uk/id/eprint/34799

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