Skip to the content

High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films

Odedra, R, Boag, N, Anthis, J, Kanjolia, R 2012, High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films , US9028917.

Full text not available from this repository. (Request a copy)

Abstract

A method for forming a cobalt-containing thin film by a vapor deposition process is provided. The method comprises using at least one precursor corresponding in structure to Formula (I); wherein R.sup.1 and R.sup.2 are independently C.sub.2-C.sub.8-alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously.

Item Type: Patent
Schools: Schools > School of Computing, Science and Engineering > Salford Innovation Research Centre (SIRC)
Funders: Sigma Aldrich HiTech
Depositing User: NM Boag
Date Deposited: 17 Jun 2015 16:59
Last Modified: 29 Oct 2015 00:10
URI: http://usir.salford.ac.uk/id/eprint/35298

Actions (login required)

Edit record (repository staff only) Edit record (repository staff only)