Growth of thin films of molybdenum and tungsten oxides by combustion CVD using aqueous precursor solutions
Davis, MJ, Benito, G, Sheel, DW and Pemble, ME 2004, 'Growth of thin films of molybdenum and tungsten oxides by combustion CVD using aqueous precursor solutions' , Chemical Vapor Deposition, 10 (1) , pp. 29-34.
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Using combustion chemical vapour deposition, layers of molybdenum and tungsten oxides have been deposited on glass and silicon at low temperatures. Inexpensive ammonium salts of molybdate and metatungstate ions were used as precursors and were delivered to the coating flame as an aqueous solution using a nebuliser. The resulting films were analysed by scanning electron microscopy (SEM), energy dispersive analysis of X-rays (EDAX), Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). These indicate that the films are continuous, moderately smooth and consist of amorphous, disordered molybdenum and tungsten trioxides.
|Additional Information:||CVD: chemical vapor deposition|
|Uncontrolled Keywords:||Combustion CVD, molybdenum oxides, tungsten oxides|
|Themes:||Subjects / Themes > Q Science > QD Chemistry|
Subjects outside of the University Themes
|Schools:||Colleges and Schools > College of Science & Technology|
Colleges and Schools > College of Science & Technology > School of Computing, Science and Engineering
Colleges and Schools > College of Science & Technology > School of Computing, Science and Engineering > Materials & Physics Research Centre
|Journal or Publication Title:||Chemical Vapor Deposition|
|Publisher:||John Wiley & Sons|
|Depositing User:||H Kenna|
|Date Deposited:||03 Sep 2007 14:19|
|Last Modified:||27 Sep 2011 12:26|
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