Davis, MJ, Benito, G, Sheel, DW and Pemble, ME 2004, 'Growth of thin films of molybdenum and tungsten oxides by combustion CVD using aqueous precursor solutions' , Chemical Vapor Deposition, 10 (1) , pp. 29-34.
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Using combustion chemical vapour deposition, layers of molybdenum and tungsten oxides have been deposited on glass and silicon at low temperatures. Inexpensive ammonium salts of molybdate and metatungstate ions were used as precursors and were delivered to the coating flame as an aqueous solution using a nebuliser. The resulting films were analysed by scanning electron microscopy (SEM), energy dispersive analysis of X-rays (EDAX), Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). These indicate that the films are continuous, moderately smooth and consist of amorphous, disordered molybdenum and tungsten trioxides.
|Additional Information:||CVD: chemical vapor deposition|
|Uncontrolled Keywords:||Combustion CVD, molybdenum oxides, tungsten oxides|
|Themes:||Subjects / Themes > Q Science > QD Chemistry
Subjects outside of the University Themes
|Schools:||Schools > School of Computing, Science and Engineering
Schools > School of Computing, Science and Engineering > Salford Innovation Research Centre (SIRC)
|Journal or Publication Title:||Chemical Vapor Deposition|
|Publisher:||John Wiley & Sons|
|Depositing User:||H Kenna|
|Date Deposited:||03 Sep 2007 13:19|
|Last Modified:||01 Dec 2015 00:02|
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