Davis, MJ, Benito, G, Sheel, DW and Pemble, ME 2004, 'Growth of thin films of molybdenum and tungsten oxides by combustion CVD using aqueous precursor solutions' , Chemical Vapor Deposition, 10 (1) , pp. 29-34.

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Abstract

Using combustion chemical vapour deposition, layers of molybdenum and tungsten oxides have been deposited on glass and silicon at low temperatures. Inexpensive ammonium salts of molybdate and metatungstate ions were used as precursors and were delivered to the coating flame as an aqueous solution using a nebuliser. The resulting films were analysed by scanning electron microscopy (SEM), energy dispersive analysis of X-rays (EDAX), Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). These indicate that the films are continuous, moderately smooth and consist of amorphous, disordered molybdenum and tungsten trioxides.

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