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Growth of thin films of molybdenum and tungsten oxides by combustion CVD using aqueous precursor solutions

Davis, MJ, Benito, G, Sheel, DW and Pemble, ME 2004, 'Growth of thin films of molybdenum and tungsten oxides by combustion CVD using aqueous precursor solutions' , Chemical Vapor Deposition, 10 (1) , pp. 29-34.

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    Abstract

    Using combustion chemical vapour deposition, layers of molybdenum and tungsten oxides have been deposited on glass and silicon at low temperatures. Inexpensive ammonium salts of molybdate and metatungstate ions were used as precursors and were delivered to the coating flame as an aqueous solution using a nebuliser. The resulting films were analysed by scanning electron microscopy (SEM), energy dispersive analysis of X-rays (EDAX), Rutherford backscattering (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). These indicate that the films are continuous, moderately smooth and consist of amorphous, disordered molybdenum and tungsten trioxides.

    Item Type: Article
    Additional Information: CVD: chemical vapor deposition
    Uncontrolled Keywords: Combustion CVD, molybdenum oxides, tungsten oxides
    Themes: Subjects / Themes > Q Science > QD Chemistry
    Subjects outside of the University Themes
    Schools: Colleges and Schools > College of Science & Technology
    Colleges and Schools > College of Science & Technology > School of Computing, Science and Engineering
    Colleges and Schools > College of Science & Technology > School of Computing, Science and Engineering > Materials & Physics Research Centre
    Journal or Publication Title: Chemical Vapor Deposition
    Publisher: John Wiley & Sons
    Refereed: Yes
    ISSN: 09481907
    Related URLs:
    Depositing User: H Kenna
    Date Deposited: 03 Sep 2007 14:19
    Last Modified: 20 Aug 2013 16:47
    URI: http://usir.salford.ac.uk/id/eprint/375

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