Low temperature growth of photoactive titania by atmospheric pressure plasma

Hodgkinson, JL, Yates, HM ORCID: https://orcid.org/0000-0002-3261-0183 and Sheel, DW 2009, 'Low temperature growth of photoactive titania by atmospheric pressure plasma' , Plasma Processes and Polymers, 6 (9) , pp. 575-582.

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Atmospheric pressure glow discharge plasma CVD was used to deposit thin films of titania at 200 8C using two different precursors. The resulting films were characterised using techniques including XPS, RBS and XRD. It was established that annealing at temperatures as low as 275 8C produced crystalline films that were photocatalytically active. When annealed at 300 8C the photoactivity was greater than that of commercially available ‘‘self-cleaning’’ titania films. The effects of the different precursors, annealing times and temperatures on the crystallinity and photoactivity are discussed.

Item Type: Article
Themes: Energy
Schools: Schools > School of Computing, Science and Engineering > Salford Innovation Research Centre
Journal or Publication Title: Plasma Processes and Polymers
Publisher: Wiley
Refereed: Yes
ISSN: 1612-8850
Depositing User: HM Yates
Date Deposited: 21 Oct 2011 09:25
Last Modified: 16 Feb 2022 13:15
URI: https://usir.salford.ac.uk/id/eprint/18571

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