Odedra, R, Boag, N, Anthis, J, Kanjolia, R 2012, High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films , US9028917.
Full text not available from this repository. (Request a copy)Abstract
A method for forming a cobalt-containing thin film by a vapor deposition process is provided. The method comprises using at least one precursor corresponding in structure to Formula (I); wherein R.sup.1 and R.sup.2 are independently C.sub.2-C.sub.8-alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously.
| Item Type: | Patent |
|---|---|
| Schools: | Schools > School of Computing, Science and Engineering > Salford Innovation Research Centre (SIRC) |
| Funders: | Sigma Aldrich HiTech |
| Depositing User: | NM Boag |
| Date Deposited: | 17 Jun 2015 16:59 |
| Last Modified: | 29 Oct 2015 00:10 |
| URI: | http://usir.salford.ac.uk/id/eprint/35298 |
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