Vernardou, D, Pemble, ME and Sheel, DW 2006, 'The growth of thermochromic VO2 films on glass by atmospheric-pressue CVD: a comparative study of precursors CVD methodology and substrates' , Chemical Vapor Deposition, 12 (5) , pp. 263-274.
Full text not available from this repository. (Request a copy)Abstract
This paper briefly reviews previous work on the growth of thermochromic VO2 thin films on glass, and then examines and compares three different CVD approaches and two precursor systems for the production of these materials. It is found that atmospheric pressure (AP) CVD using vanadium(IV) chloride (VCl4) and H2O on commercial SiO2-precoated glass yields the smoothest films, with transition temperature (Tc) values of around 58 °C, while APCVD using vanadyl(IV) acetyl acetonate (VO(acac)2) on the same substrates produces slightly rougher films, which are more crystalline and possess a Tc with a value as low as 51.5 °C. Films grown using VO(acac)2 in a direct liquid-injection metal-organic (DLI-MO) CVD reactor exhibited considerably poorer thermochromic and morphological properties as compared with those grown by APCVD. These findings are discussed in terms of possible variations in growth mechanisms occurring during the three processes studied.
| Item Type: | Article |
|---|---|
| Themes: | Subjects / Themes > Q Science > QD Chemistry Subjects outside of the University Themes |
| Schools: | Schools > School of Computing, Science and Engineering Schools > School of Computing, Science and Engineering > Salford Innovation Research Centre |
| Journal or Publication Title: | Chemical Vapor Deposition |
| Publisher: | John Wiley & Sons |
| Refereed: | Yes |
| ISSN: | 09481907 |
| Depositing User: | H Kenna |
| Date Deposited: | 03 Sep 2007 13:30 |
| Last Modified: | 01 Dec 2015 00:00 |
| URI: | http://usir.salford.ac.uk/id/eprint/377 |
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