JL Hodgkinson

Research Fellow

Mat Research

Chemical Vapour Deposition (CVD), Thin Flim Technology, Plasma Processes, Solid State Characterisation, Process Equipment Design, Application Testing, Chemical Engineering, Optical Systems, Formulation, Surface Science

I am a materials scientist with significant expertise in the field of thin film deposition and characterisation, with a special interest in plasma activated processes. I have a proven track record of innovation supported by funding awards, commercial projects, academic publications and a patent pending. I have excellent interpersonal skills developed through academic collaboration and customer facing roles in industry.

2004-2007 PhD Physical Chemistry, The University of Salford. “Atmospheric Pressure Glow Discharge Plasma Enhanced Chemical Vapour Deposition of Titania and Aluminium Based Thin Films” 2000-2003 BSc (Hons) Chemistry 2(i), (Part Time) The University of Salford. 1998-2000 HNC in Chemistry, (Part time) University of Central Lancashire. 1994-1996 A-Levels: Chemistry, Physics, Biology and General Studies.

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Latest Additions

  1. The University of Salford 2014, Method of coating and etching , GB2505685.
  2. Hodgkinson, JL and Sheel, DW 2013, 'Advances in atmospheric pressure PECVD : The influence of plasma parameters on film morphology' , Surface & Coatings Technology, 230 , pp. 73-76.
  3. Hodgkinson, JL, Yates, HM and Sheel, DW 2015, 'Enhanced optical performance of APCVD zinc oxide via post growth plasma treatment at atmospheric pressure' , Physica Status Solidi (c) .